Electron Beam and Sputter Physical Vapour Deposition system

The University of Manchester has a requirement to acquire an advanced multi-functional plasma assisted physical vapour deposition (PVD) facility. We would want to be able to deposit ceramic and metallic systems including alloys. This is for a range of research applications such as corrosion and wear protection.

The system should incorporate the following features, which may be provided in one or more systems: Multi-Target Sputter PVD System incorporating at least 2 sputter targets and bias capability to the targets and substrate. A twin Electron Beam (EB) dual-evaporant source PVD system, incorporating enhanced plasma assistance using a non-contaminating plasma intensification device based on a hollow cathode discharge.

Additional information: To express an interest in this project please visit the website below where you will need to register to obtain tender documentation.

https://in-tendhost.co.uk/universityofmanchester/aspx/Home

Is a Recurrent Procurement Type? : No